Development of fluoropolymer for 193nm immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Shirota, Naoko ^a   Takebe, Yoko ^a   Sasaki, Takashi ^a   Yokokoji, Osamu ^a   Toriumi, Minoru ^b   Masuhara, Hiroshi ^b  

^a ASAHI GLASS CO LTD   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Co polymerization; Dissolution rate; Fluoropolymer; Immersion; QCM; Swelling; Top coat; Water

Indexed keywords

COPOLYMERIZATION; DIFFUSION; DISSOLUTION; HYDROPHOBICITY; LITHOGRAPHY; STRUCTURE (COMPOSITION);

CO-POLYMERIZATION; DISSOLUTION RATE; FLUOROPOLYMER; IMMERSION; QCM; TOP-COAT;

FLUORINE CONTAINING POLYMERS;

EID: 33745602795     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656234     Document Type: Conference Paper

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