Landing energy influence on CD-SEM measurement precision and accuracy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 II, Issue , 2006, Pages

  Fabre, Anne Lise ^a   Foucher, Johann ^a   Poulingue, M ^b   Fabre, P ^b   Sundaram, Ganesh ^b  

^a CEA LETI   (France)

^b Soluris Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION; ELECTRON BEAMS; MEASUREMENTS; RADIATION; SENSITIVITY ANALYSIS;

ELECTRON BEAM RADIATION; MEASUREMENT ACQUISITION; PROBE CURRENT; ULTRA LOW VOLTAGE (ULV);

LITHOGRAPHY;

EID: 33745598521     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.660267     Document Type: Conference Paper

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