DNA as an electron-beam-sensitive reagent for nanopatterning

Advanced Materials

Volumn 18, Issue 12, 2006, Pages 1517-1520

  Lin, Hung Yi ^c   Tsai, Li Chu ^d   Chi, Pei Yin ^a   Chen, Chii Dong ^a,b  

^a INSTITUTE OF PHYSICS   (Taiwan)

^b NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^c NATIONAL UNIVERSITY OF TAINAN   (Taiwan)

^d NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BIOSENSORS; ELECTRON BEAM LITHOGRAPHY; ELECTRONIC PROPERTIES; MICROLENSES; NANOSTRUCTURED MATERIALS; PATTERN RECOGNITION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SENSITIVITY ANALYSIS;

ELECTRON-BEAM-SENSITIVE REAGENTS; MOLECULAR ELECTRONICS; NANOPATTERNING; OLIGONUCLEOTIDE DESTRUCTION;

DNA;

EID: 33745574412     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200502083     Document Type: Article

References (13)

1. E. Braun, Y. Eichen, U. Silvan,. G. Ben-Yoseph, Nature 1998, 391, 775.
2. K. Keren, R. S. Berman, E. Buchstab, U. Sivan, E. Braun, Science 2003, 302, 1380.
3. C. A. Mirkin, R. L. Letsinger, R. C. Mucic, J. J. Storhoff, Nature 1996, 382, 607.
4. A. Fu, C. Micheel, M. J. Cha, H. Chang, H. Yang, A. P. Alivisatos, J. Am. Chem. Soc. 2004, 126, 10832.
5. J. Hu, Y. Zhang, H. Gao, M. Li, U. Hartmann, Nano Lett. 2002, 2, 55.
6. A. B. Steel, R. L. Levicky, T. M. Herne, M. J. Tarlov, Biophys. J. 2000, 79, 975.
7. S. Pathak, P. M. Dentinger, Langmuir 2003, 19, 1948.
8. L. M. Demers, D. S. Ginger, S.-J. Park, Z. Li, S.-W Chung, C. A. Mirkin, Science 2002, 296, 1836.
9. G. Zhang, T. Tanii, T. Zako, T. Funatsu, I. Ohdomari, Sens. Actuators B 2004, 97, 243.
10. B. Boudaiffa, P. Cloutier, D. Hunting, M. A. Huels, L. Sanche, Science 2000, 287, 1658.
11. R. Glass, M. Arnold, J. Blümmel, A. Küller, M. Möller, J. P. Spatz, Adv. Funct. Mater. 2003, 13, 569.
12. V. L. Colvin, A. N. Goldstein, A. P. Alivisatos, J. Am. Chem. Soc. 1992, 114, 5221.
13. T. M. Herne, M. J. Tarlov, J. Am. Chem. Soc. 1997, 119, 8916.