Dielectric and ferroelectric properties of pulsed laser deposited lead zirconate titanate (65/35) thin film

Thin Solid Films

Volumn 513, Issue 1-2, 2006, Pages 95-98

  Pandey, S K ^a   James, A R ^a   Prakash, Chandra ^a   Goel, T C ^b   Zimik, K ^c  

^a SOLID STATE PHYSICS LABORATORY   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

^c LASER SCIENCE AND TECHNOLOGY CENTRE   (India)

Author keywords

Dielectric properties; Leadsironate titanate; Pulsed laser deposition

Indexed keywords

ANNEALING; DIELECTRIC PROPERTIES; ELECTRIC FIELDS; FERROELECTRICITY; LEAD COMPOUNDS; PULSED LASER DEPOSITION; SINTERING;

BACKGROUND PRESSURE; LEAD ZIRCONATE TITANATE (PZT) THIN FILMS; LEADSIRONATE TITANATE; WELL-CRYSTALLIZED FILMS;

THIN FILMS;

EID: 33745443208     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.01.047     Document Type: Article

References (19)

1. Scott J.F., Kammerdimer L., Parris M., Trayner S., Ottenbacher V., Shawabke A., and Oliver W.F. J. Appl. Phys. 64 (1988) 787
2. Okuyama M., Matsui Y., Nakamo H., and Hamakawa Y. Ferroelectrics 33 (1981) 235
3. Auciello O., Dat R., and Ramesh R. In: Paz de Araujo C., Scott J.F., and Taylor G.W. (Eds). Ferroelectric Thin Films: Synthesis and Basic Properties (1996), Gordon and Breach Publishers, The Netherlands 525
4. Pereira M., Peixoto A.G., and Gomes M.J.M. J. Eur. Ceram. Soc. 21 (2001) 1353
5. Scott J.F., Araujo C.A., Melnick B.M., McMillan L.D., and Zuleg R. J. Appl. Phys. 70 (1991) 382
6. Flouquet N., Hector J., and Gaucher P. J. Appl. Phys. 84 (1998) 3815
7. Thakoor S., and Maserjian J. J. Vac. Sci. Technol., A, Vac. Surf. Films 12 (1994) 295
8. Dawber M., and Scott J.F. Appl. Phys. Lett. 76 (2000) 1060
9. Robels U., Calderwood J.H., and Arlt G. J. Appl. Phys. 77 (1995) 4002
10. Grossman M., Lohse O., Bolten D., Boettger U., Schneller T., and Waser R. J. Appl. Phys. 92 (2002) 2680
11. Kim W.J., and Wu H.D. J. Appl. Phys. 88 (2000) 5448
12. Kelman M.B., Schloss L.F., McIntyre P.C., Hendrix B.C., Bilodeau S.M., and Roeder J.F. J. Appl. Phys. 80 (2002) 1258
13. Tyunina M., Levoska J., Sternberg A., and Leppavuori S. J. Appl. Phys. 84 (1998) 6800
14. Lee J.-S., Park E.-C., Park J.-H., Lee B., and Joo S.-K. In: Schwartz R.W., McIntyre P.C., Miyasaka Y., Summerfelt S.R., and Wouters D. (Eds). Ferroelectric Thin Films VIII, Boston, USA, Nov. 29-Dec. 2, 1999. Materials Research Society Symposium Proceedings vol. 596 (2000) 217
15. Boerasu I., Pintilie L., Pereira M., Vasilevskiy M.I., and Gomes M.J.M. J. Appl. Phys. 93 (2003) 4776
16. Lee J., Choi C.H., Park B.H., Noah T.W., and Lee J.K. Appl. Phys. Lett. 72 (1998) 3380
17. Pandey S.K., James A.R., Prakash C., Goel T.C., and Zimik K. Mater. Sci. Eng., B, Solid-State Mater. Adv. Technol. 112 (2004) 96
18. Tuttle B.A., Garino T.J., Voight R.A., Headley T.J., Dimos D., and Eatough M.O. In: Auciello O., and Waser R. (Eds). Science and Technology of Electroceramic Thin Films (1995), Kluwer Academic, Dordrecht, The Netherlands 117
19. Ren S., Lu C., Shen H.M., and Wang Y. Phys. Rev., B 55 (1997) 3485