Modelling of morphological changes by surface diffusion in silicon trenches

ECS Transactions

Volumn 2, Issue 2, 2006, Pages 363-374

  Muller T ^a   Dantz, D ^c   Ammon, W V ^a   Virbulis, J ^b   Bethers, U ^b  

^a SILTRONIC AG   (Germany)

^b Ctr for Proc Analysis and Research   (Latvia)

^c VOLKSWAGEN AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CYLINDRICAL TRENCHES; LAYER FORMATION; MORPHOLOGICAL CHANGES; SURFACE DIFFUSION;

DIFFUSION; GENETIC ALGORITHMS; MORPHOLOGY; OPTIMIZATION; PERTURBATION TECHNIQUES; PHASE DIAGRAMS;

SEMICONDUCTING SILICON;

EID: 33745435016     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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