Substrate temperature dependence of microcrystalline silicon growth by PECVD technique

Journal of Non-Crystalline Solids

Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 1045-1048

  Mukhopadhyay, Sumita ^a   Chowdhury, Amartya ^a   Ray, Swati ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

Author keywords

Microstructure; Silicon; Thin films

Indexed keywords

DOPING (ADDITIVES); FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SEMICONDUCTING SILICON; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

HYDROGEN EVOLUTION; RAMAN MEASUREMENTS; SILICON FILMS; SUBSTRATE TEMPERATURE;

CRYSTAL GROWTH;

EID: 33745432497     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.11.095     Document Type: Article

References (11)

1. Meier J., Torres P., Platz R., Dubail S., Kroll U., Anna Selvan J.A., Vaucher P.N., Hof Ch., Fischer D., Keppner H., Shah A., Uferrt K.-D., Giannoules P., and Koehler J. Mater. Res. Symp. Proc. 420 (1996) 3
2. He S.S., and Lucovsky G. Mater. Res. Soc. Symp. Proc. 336 (1994) 25
3. Kamei T., Kondo M., and Matsuda A. Jpn. J. Appl. Phys. 37 (1998) L265
4. Hasegawa S., Sakata M., Inokuma T., and Kurata Y. J. Appl. Phys. 84 (1998) 584
5. Siebke F., Yata S., Hishikawa Y., and Tanaka M. J. Non-Cryst. Solids 227-230 (1998) 977
6. Vanacek M., Kocka J., Strichlik J., Kosicek Z., Stika V., and Triska A. Sol. Energy Mater. 8 (1983) 411
7. Beyer W., and Wagnar H. J. Non-Cryst. Solids 59&60 (1983) 161
8. Beyer W. Sol. Energy Mater. Sol. Cells 78 (2003) 235
9. Matsuda A. J. Non-Cryst. Solids 59&60 (1983) 767
10. Tsu D.V., Chao B.S., Ovshinsky S.R., Guha S., and Yang J. J. Appl. Phys. Lett. 71 (1997) 1317
11. Veprek S., Sarott F.-A., and Iqbal Z. Phys. Rev. B 36 (1997) 3344