Plasma enhanced chemical vapor deposition of ZnO thin films

Journal of Non-Crystalline Solids

Volumn 352, Issue 23-25, 2006, Pages 2343-2346

  Shishodia, P K ^a   Kim, H J ^b   Wakahara, A ^b   Yoshida, A ^b   Shishodia, G ^a   Mehra, R M ^c  

^a UNIVERSITY OF DELHI   (India)

^b TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^c UNIVERSITY OF DELHI   (India)

Author keywords

Chemical vapor deposition; Films and coatings

Indexed keywords

ANNEALING; ARGON; ATOMIC FORCE MICROSCOPY; COATINGS; GLASS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; THERMAL EFFECTS; THIN FILMS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION;

DIETHYLZINC; GLASS SUBSTRATES; SUBSTRATE TEMPERATURES; UV BAND-EDGE EMISSION;

ZINC OXIDE;

EID: 33745397150     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2006.01.086     Document Type: Article

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