Low-temperature synthesis of aligned carbon nanofibers on glass substrates by inductively coupled plasma chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 6 A, 2006, Pages 5326-5328

  Honda, Shin Ichi ^a   Lee, Kuei Yi ^a   Aoki, Katsunori ^b   Hirao, Takashi ^c   Oura, Kenjiro ^a   Katayama, Mitsuhiro ^a  

^a OSAKA UNIVERSITY   (Japan)

^b Rodel Nitta Company   (Japan)

^c KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Glass substrate; Inductively coupled plasma chemical vapor deposition; Low temperature synthesis; Metal buffer layer; Vertically aligned carbon nanofiber

Indexed keywords

CARBON; CATALYSTS; CHEMICAL VAPOR DEPOSITION; GLASS; SUBSTRATES; THIN FILMS;

GLASS SUBSTRATE; INDUCTIVELY COUPLED PLASMA CHEMICAL VAPOR DEPOSITION; LOW-TEMPERATURE SYNTHESIS; METAL BUFFER LAYER; VERTICALLY ALIGNED CARBON NANOFIBER;

NANOSTRUCTURED MATERIALS;

EID: 33745243370     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.5326     Document Type: Article

References (23)

1. S. Iijima: Nature 354 (1991) 56.
2. A. V. Melechko, V. I. Merkulov, T. E. McKnight, M. A. Klein, D. H. Lowndes and M. L. Simpson: J. Appl. Phys. 97 (2005) 041301.
3. M. S. Dresselhaus, G. Dresselhaus and P. Avouris: Carbon Nanotubes: Synthesis, Structure, Properties, and Applications (Springer, Berlin, 2001).
4. M. Katayama, S. Honda, T. Ikuno, K.-Y. Lee, M. Kishida, Y. Murata and K. Dura: e-J. Surf. Sci. Nanotechnol. 2 (2004) 244.
5. M. Katayama, K.-Y. Lee, S. Honda, T. Hirao and K. Oura: Jpn. J. Appl. Phys. 43 (2004) L774.
6. K.-Y. Lee, M. Katayama, S. Honda, T. Kuzuoka, T. Miyake, Y. Terao, J. G. Lee, H. Mori, T. Hirao and K. Dura: Jpn. J. Appl. Phys. 42 (2003) L804.
7. S. Honda, M. Katayama, K.-Y. Lee, T. Ikuno, S. Ohkura, K. Oura, H. Furuta and T. Hirao: Jpn. J. Appl. Phys. 42 (2003) L441.
8. M. A. Lieberman and A. J. Lichtenberg: Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
9. J. B. O. Caughman, L. R. Baylor, M. A. Guillorn, V. I. Merkulov, D. H. Lowndes and L. F. Allard: Appl. Phys. Lett. 83 (2003) 1207.
10. L. Delzeit, I. McAninch. B. A. Cruden, D. Hash, B. Chen, J. Han and M. Meyyappan: J. Appl. Phys. 91 (2002) 6027.
11. S. Amelinckx, X. B. Zhang, D. Bernaerts, X. F. Zhang, V. Ivanov and J. B. Nagy: Science 265 (1994) 635.
12. T. Ikuno, M. Katayama, S. Takahashi, K. Kamada, S. Hiwatashi, S. Ohkura, S. Honda and K. Oura: Jpn. J. Appl. Phys. 42 (2003) 6717.
13. R. S. Wagner and W. C. Ellis: Appl. Phys. Lett. 4 (1964) 89.
14. K. Oura, V. G. Lifshits, A. A. Saranin, A. V. Zotov and M. Katayama: Surface Science; An Introduction (Springer, Berlin, 2003).
15. K. Oura, M. Katayama, S. Honda, K.-Y. Lee, N. Hayashi, T. Hirao, K. Endo, M. Kimoto, K. Nishimura and K. Nishio: Jpn. J. Appl. Phys. 42 (2003) L1167.
16. L. Nilsson, O. Groening, C. Emmenegger, O. Kuettel, E. Schaller, L. Schlapbach, H. Kind, J.-M. Bonard and K. Kern: Appl. Phys. Lett. 76 (2000) 2071.
17. K. B. K. Teo, M. Chhowalla, G. A. J. Amaratunga, W. I. Milne, G. Pirio, P. Legagneux, F. Wyczisk, D. Pribat and D. G. Hasko: Appl. Phys. Lett. 80 (2002) 2011.
18. J. S. Suh, K. S. Jeong, J. S. Lee and I. Han: Appl. Phys. Lett. 80 (2002) 2392.
19. P. E. Anderson and N. M. Rodríguez: Chem. Mater. 12 (2000) 823.
20. V. I. Merkulov, D. H. Lowndes, Y. Y. Wei, G. Eres and E. Voelkl: Appl. Phys. Lett. 76 (2000) 3555.
21. V. I. Merkulov, A. V. Melechko, M. A. Guillorn, M. L. Simpson, D. H. Lowndes, J. H. Whealton and R. J. Raridon: Appl. Phys. Lett. 80 (2002) 4816.
22. A. M. Cassell, Q. Ye, B. A. Cruden, J. Li, P. C. Sarrazin, H. T. Ng, J. Han and M. Meyyappan: Nanotechnology 15 (2004) 9.
23. S. Hofmann, M. Cantoro, B. Kleinsorge, C. Casiraghi, A. Parvez, J. Robertson and C. Ducati: J. Appl. Phys. 98 (2005) 034308.