Influence of Plasma State on the Structural Property of Vertically Oriented Carbon Nanotubes Grown by RF Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 10, 2003, Pages 6717-6720

  Ikuno, Takashi ^a   Katayama, Mitsuhiro ^a   Kamada, Kazunori ^a   Hiwatashi, Shinji ^a   Ohkura, Shigeharu ^a   Honda, Shin Ichi ^a   Oura, Kenjiro ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Plasma diagnostic; Plasma enhanced chemical vapor deposition; Structural properties; Vertically oriented carbon nanotube

Indexed keywords

ANNEALING; CRYSTALLINE MATERIALS; ETCHING; FIELD EMISSION DISPLAYS; LASER ABLATION; METHANE; MONOCHROMATORS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; NICKEL; OPTICAL FIBER COUPLING; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ETCHANTS; PLASMA STATES;

CARBON NANOTUBES;

EID: 0348219408     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.6717     Document Type: Article

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