The growth of single cubic phase ZnS thin films on silica glass by plasma-assisted metalorganic chemical vapor deposition

Thin Solid Films

Volumn 513, Issue 1-2, 2006, Pages 114-117

  Zhang, Z Z ^a   Shen, D Z ^a   Zhang, J Y ^a   Shan, C X ^a   Lu, Y M ^a   Liu, Y C ^a   Li, B H ^a   Zhao, D X ^a   Yao, B ^a   Fan, X W ^a  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

Author keywords

Chemical vapor; Luminescence; Mental organic; X ray diffraction; Zinc sulphide

Indexed keywords

FILM GROWTH; FUSED SILICA; HYDROGEN SULFIDE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; STOICHIOMETRY; X RAY DIFFRACTION; ZINC SULFIDE;

GAS FLOW RATIOS; PHOTOLUMINESCENCE SPECTROSCOPY; PLASMA ASSISTANCE;

THIN FILMS;

EID: 33745240926     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.01.054     Document Type: Article

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