Effect of substrate bias on growth and properties of carbon nanotubes deposited under no hydrogen introduction by MPCVD

Diamond and Related Materials

Volumn 15, Issue 4-8, 2006, Pages 1053-1058

  Chuang, P K ^a   Teng, I J ^a   Wang, W H ^a   Kuo, C T ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Carbon nanotubes (CNTs); Field emission; Microwave plasma chemical vapor deposition (MPCVD); Substrate bias

Indexed keywords

CATALYSTS; CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; HYDROGEN; METHANE; MICROWAVES; PLASMAS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SUBSTRATES;

FIELD EMISSION; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MPCVD); SUBSTRATE BIAS; TUBE NUMBER DENSITIES;

CARBON NANOTUBES;

EID: 33745237144     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.10.046     Document Type: Article

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