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Volumn 49, Issue 4, 2006, Pages 778-785

Be coatings on spherical surface for NIF target development

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; BERYLLIUM; DIFFUSION; INERTIAL CONFINEMENT FUSION; MASS SPECTROMETERS; SPUTTER DEPOSITION; SURFACE ROUGHNESS;

EID: 33745048999     PISSN: 15361055     EISSN: None     Source Type: Journal    
DOI: 10.13182/FST06-A1201     Document Type: Conference Paper
Times cited : (25)

References (19)
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  • 5
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    • Evaluation of boron-doped beryllium as an ablator for NIF target capsules
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    • The microstructure of sputter-deposited coatings
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    • Characterization of surface structure in sputtered Al films: Correlation to microstructure evolution
    • A.E. LITA and I.E. SANCHEZ, JR., "Characterization of Surface Structure in Sputtered Al Films: Correlation to Microstructure Evolution," J. Applied Phys. 85, 876 (1999).
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    • Lita, A.E.1    Sanchez Jr., I.E.2
  • 8
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    • Ballistic deposition onto inclined surface
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    • Meakin, P.1
  • 9
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    • Dynamical scaling behavior in two dimensional ballistic deposition with shadowing
    • J. YU and J.G. AMAR, "Dynamical Scaling Behavior in Two Dimensional Ballistic Deposition With Shadowing," Phys. Rev. E 66, 21603 (2002).
    • (2002) Phys. Rev. E , vol.66 , pp. 21603
    • Yu, J.1    Amar, J.G.2
  • 11
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    • Microstructure control in semiconductor metallization
    • J.M.E. HARPER and K.P. RODBELL, "Microstructure Control in Semiconductor Metallization," J. Vac. Sci. Technol. B15, 763 (1997).
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    • Harper, J.M.E.1    Rodbell, K.P.2
  • 13
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    • An ion-assisted Mo-Si deposition process for planarizing reticle substrates for extreme ultraviolet lithography
    • P.B. MIRKARIMI, E.A. SPILLER, D.G. STEARNS, V. SPERRY, and S.L. BAKER, "An Ion-assisted Mo-Si Deposition Process for Planarizing Reticle Substrates for Extreme Ultraviolet Lithography," IEEE J. Quantum Electronics 37, 1514 (2001).
    • (2001) IEEE J. Quantum Electronics , vol.37 , pp. 1514
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    • Effect of deposition interruption and substrate bias on the structure of sputter-deposited yttria-stabilized zirconia thin films
    • D.E. RUDDELL, B.R. STONER and J.Y. THOMPSON, "Effect of Deposition Interruption and Substrate Bias on the Structure of Sputter-Deposited Yttria-Stabilized Zirconia Thin Films," J. Vac. Sci. Technol. A20, 1744 (2002).
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.