Protein patterning using a microstructured organosilane layer fabricated by VUV light lithography as a template

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 284-285, Issue , 2006, Pages 532-534

  Yamaguchi, Munehiro ^a   Nishimura, Okio ^a   Lim, Sung Hyuk ^a   Shimokawa, Katsuyoshi ^a   Tamura, Tomohiro ^a   Suzuki, Masaaki ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

ECFP; Etching; Fluorescent protein; Organosilane; Protein patterning; Vacuum ultraviolet light (VUV)

Indexed keywords

ETCHING; FLUORESCENCE; LITHOGRAPHY; MICROSTRUCTURE; ORGANOMETALLICS; PATTERN MATCHING; SILANES; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS;

AMINOPROPYLTRIETHOXYSILANE (APTES); ECFP; FLUORESCENT PROTEIN; ORGANOSILANE; PROTEIN PATTERNING; VACUUM ULTRAVIOLET LIGHT (VUV);

PROTEINS;

CYAN FLUORESCENT PROTEIN; FUNCTIONAL GROUP; METAL; NANOPARTICLE; SILANE; SILANE DERIVATIVE; SILICON DIOXIDE;

AMINO TERMINAL SEQUENCE; ARTICLE; BIOTECHNOLOGY; CHEMICAL MODIFICATION; CHEMICAL PROCEDURES; FLUORESCENCE MICROSCOPY; LIQUID; MICROSCOPE; NERVE CELL; PARTICLE SIZE; PHOTOSYNTHESIS; PRIORITY JOURNAL; PROTEIN ANALYSIS; PROTEIN BINDING; PROTEIN IMMOBILIZATION; PROTEIN ISOLATION; SEPARATION TECHNIQUE; ULTRAVIOLET RADIATION;

EID: 33744913039     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2005.10.089     Document Type: Article

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