Structural and electrical properties of NiCr thin films annealed at various temperatures in a vacuum and a nitrogen ambient for π -type attenuator applications

Journal of the Electrochemical Society

Volumn 153, Issue 7, 2006, Pages

  Phuong, Nguyen Mai ^a   Kim, Dong Jin ^b   Kang, Byoung Don ^a,b   Yoon, Soon Gil ^a  

^a Chungnam National University   (South Korea)

^b KMC Technology Co Ltd   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; NITROGEN; VACUUM;

CO-SPUTTERING TECHNIQUE; CRYSTALLINITY; NICR THIN FILMS; TEMPERATURE COEFFICIENT;

THIN FILMS;

EID: 33744783986     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2202696     Document Type: Article

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