The influence of the argon pressure and substrate temperature on the structure of r.f.-sputtered CrNi(65:35), CrNi(50:50) and CrNi(20:80) thin films

Thin Solid Films

Volumn 275, Issue 1-2, 1996, Pages 152-154

  Birjega, M I ^a   Alexe, M ^a  

^a NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

Author keywords

Alloys; Electron microscopy; Growth mechanism; Structural properties

Indexed keywords

ALKALI METAL ALLOYS; ARGON; CHROMIUM ALLOYS; CRYSTAL STRUCTURE; ELECTRON MICROSCOPY; EPITAXIAL GROWTH; PRESSURE; SOLID SOLUTIONS; SPUTTER DEPOSITION; SUBSTRATES; TEMPERATURE;

ALKALI HALIDE SUBSTRATES; ARGON PRESSURE; EFFECT OF DEPOSITION PARAMETERS; GROWTH MECHANISM; STRUCTURAL PROPERTIES; SUBSTRATE TEMPERATURE; TRANSMISSION ELECTRON DIFFRACTION;

THIN FILMS;

EID: 0030123409     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)07030-3     Document Type: Article

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