Effect of chromium concentration on the electrical properties of NiCr thin films resistor deposited at room temperature by magnetron cosputtering technique

Journal of the Electrochemical Society

Volumn 153, Issue 1, 2006, Pages

  Phuong, Nguyen Mai ^a   Kim, Dong Jin ^b   Kang, Byoung Don ^a   Kim, Chang Soo ^c   Yoon, Soon Gil ^a  

^a Chungnam National University   (South Korea)

^b KMC Technology Co Ltd   (South Korea)

^c Korea Research Institute of Standards and Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; CRYSTAL STRUCTURE; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; THERMAL EFFECTS;

NICR THIN FILMS RESISTORS; ROOT-MEAN-SQUARE (RMS) ROUGHNESS; TEMPERATURE COEFFICIENT;

THIN FILM TRANSISTORS;

EID: 33645517074     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2129332     Document Type: Article

References (12)

1. R. Tavzes, E. Kansky, A. Banovek, A. Zalar, M. Gregorec, A. Barna, P. B. Barna, and I. Pozsgai, Thin Solid Films, 36, 379 (1976).
2. H. Dintner and F. Thrum, Phys. Status Solidi A, 111, 551 (1989).
3. A. Belu-Marian, R. Manaila, G. Korony, C. Constantin, and A. Devenyi, Thin Solid Films, 139, 15 (1986).
4. L. Toth, A. Barna, and G. Safran, J. Vac. Sci. Technol. A, 5, 1856 (1987).
5. A. Hanousovszky, M. Koltai, and J. Trifonov, Thin Solid Films, 85, 335 (1981).
6. P. L. Rossiter, The Electrical Resistivity of Metals and Alloys, Cambridge University Press, Cambridge (1987).
7. P. Mengucci, M. Costato, and G. Majni, Thin Solid Films, 209, 67 (1992).
8. S. G. Hur, D. J. Kim, B. D. Kang, and S. G. Yoon, J. Vac. Sci. Technol. B, 22, 2698 (2004).
9. M. Ishikawa, H. Enomoto, N. Mikamoto, T. Nakamura, M. Matsuoka, and C. Iwakura, Surf. Coat. Technol., 110, 121 (1998).
10. J. Musil and F. Regent, J. Vac. Sci. Technol., 16, 3301 (1971).
11. M. I. Birjega and M. Alexe, Thin Solid Films, 275, 152 (1996).
12. M. I. Birjega, C. A. Constantin, I. Th. Florescu, and C. Sarbu, Thin Solid Films, 92, 315 (1982).