Effect of light germanium doping on thermal donors in Czochralski silicon wafers

Materials Science in Semiconductor Processing

Volumn 9, Issue 1-3, 2006, Pages 110-113

  Cui, Can ^a   Yang, Deren ^a   Ma, Xiangyang ^a   Li, Ming ^a   Que, Duanlin ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Germanium doping; Silicon; Thermal donor

Indexed keywords

ABSORPTION SPECTROSCOPY; CRYSTAL GROWTH FROM MELT; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROSTRUCTURE; SEMICONDUCTOR DOPING; SILICON WAFERS;

GE-DOPING; GERMANIUM DOPING; ISOTHERMAL ANNEALING; THERMAL DONOR;

GERMANIUM COMPOUNDS;

EID: 33744536735     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2006.01.034     Document Type: Article

References (10)

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