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Volumn 12, Issue 8, 2006, Pages 786-789

A novel method to fabricate complex three-dimensional microstructures

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; HOT PRESSING; LITHOGRAPHY; PHOTONS; SUBSTRATES; ULTRAVIOLET RADIATION;

EID: 33744511556     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-006-0099-x     Document Type: Article
Times cited : (3)

References (9)
  • 1
    • 0031674888 scopus 로고    scopus 로고
    • High-aspect ratio, ultrathick, negative-tone near-UV photoresist and its application for MEMS
    • Lorenz H (1998) High-aspect ratio, ultrathick, negative-tone near-UV photoresist and its application for MEMS. Sensor Actuator A 64:33-39
    • (1998) Sensor Actuator A , vol.64 , pp. 33-39
    • Lorenz, H.1
  • 4
    • 84874633860 scopus 로고    scopus 로고
    • Fabrication of integrated microlens array mold and mold insert for mass production
    • MEMS/MOEMS Technologies and Applications
    • Ruey F (2002) Fabrication of integrated microlens array mold and mold insert for mass production. MEMS/MOEMS Technologies and Applications. SPIE 4928:85-92
    • (2002) SPIE , vol.4928 , pp. 85-92
    • Ruey, F.1
  • 6
    • 0034253567 scopus 로고    scopus 로고
    • Controller gain tuning of a simultaneous multi-axis PID control system using the Taguchi method
    • Lee K, Kim J (2000) Controller gain tuning of a simultaneous multi-axis PID control system using the Taguchi method. Control Eng Pract 8:949-958
    • (2000) Control Eng Pract , vol.8 , pp. 949-958
    • Lee, K.1    Kim, J.2
  • 7
    • 3042690666 scopus 로고    scopus 로고
    • Process research of high-aspect ratio microstructure using SU-8 resist
    • Liu J, Cai B, Zhu J, Ding G, Zhao X, Yang C, Chen D (2004) Process research of high-aspect ratio microstructure using SU-8 resist. J Microsy Technol 10(4):265-268
    • (2004) J Microsy Technol , vol.10 , Issue.4 , pp. 265-268
    • Liu, J.1    Cai, B.2    Zhu, J.3    Ding, G.4    Zhao, X.5    Yang, C.6    Chen, D.7
  • 9
    • 0038798179 scopus 로고
    • Micromachining applications of a high resolution ultrathick photoresist
    • Lee KY, Labianca N (1995) Micromachining applications of a high resolution ultrathick photoresist. J Vac Sci Technol B13(6):3012-3016
    • (1995) J Vac Sci Technol , vol.B13 , Issue.6 , pp. 3012-3016
    • Lee, K.Y.1    Labianca, N.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.