Modification of temperature dependence of dielectric properties by symmetry-controlled superlattice thin films of BaZrxTi 1-xO3

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 5 B, 2006, Pages 4484-4488

  Kawahara, Toshio ^a   Ohno, Takahiro ^a   Doi, Atsuhiro ^a   Tabata, Hitoshi ^a   Kawai, Tomoji ^a   Hino, Takanori ^b  

^a OSAKA UNIVERSITY   (Japan)

^b NIIHAMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Dielectric constant; Ferroelectric materials; Relative permittivity; Superlattice thin films; Symmetry breaking

Indexed keywords

DIELECTRIC PROPERTIES; ELECTRON MICROSCOPY; FERROELECTRIC MATERIALS; FERROELECTRIC THIN FILMS; PEROVSKITE; PULSE AMPLIFIERS; SUPERLATTICES; X RAY DIFFRACTION;

RELATIVE PERMITTIVITY; SUPERLATTICE THIN FILMS; SYMMETRY BREAKING;

BARIUM COMPOUNDS;

EID: 33744473067     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.4484     Document Type: Article

References (31)

1. Y. Makiuchi, R. Aoyagi, Y. Hiruma, H. Nagata and T. Takenaka: Jpn. J. Appl. Phys. 44 (2005) 4350.
2. F. Uchikoba, T. Ito and S. Nakajima: Jpn. J. Appl. Phys. 34 (1995) 2374.
3. Y. Yamashita, K. Harada, T. Tao and N. Ichinose: Integrated Ferroelectr. 13 (1996) 17.
4. G. A. Smolensky and A. I. Agranovskaja: Sov. Phys. Tech. Phys. 3 (1958) 1380.
5. L. E. Cross: Ferroelectrics 76 (1987) 241.
6. D. Viehland, S. J. Jang, L. E. Cross and M. Wutting: J. Appl. Phys. 68 (1990) 2916.
7. V. Westphal, W. Kleemann and M. D. Glinchuk: Phys. Rev. Lett. 68 (1992) 847.
8. L. E. Cross: Jpn. J. Appl. Phys. 34 (1995) 2525.
9. D. Viehland and J.-F. Li; J. Appl. Phys. 75 (1994) 1705.
10. N. Setter and L. E. Cross: J. Appl. Phys. 51 (1980) 4356.
11. Z. Yu, C. Ang, R. Guo and A. S. Bhalla: J. Appl. Phys. 92 (2002) 2655.
12. P. S. Dobal, A. Dixit, R. S. Katiyar, Z. Yu, R. Guo and A. S. Bhalla: J. Appl. Phys. 89 (2001) 8085.
13. Y. Hotta, G. W. J. Hassink, T. Kawai and H. Tabata: Jpn. J. Appl. Phys. 42 (2003) 5908.
14. M. Furuya and A. Ochi: Jpn. J. Appl. Phys. 33 (1994) 5482.
15. H. Takahashi, K. Ayusawa and N. Sakamoto: Jpn. J. Appl. Phys. 36 (1997) 5597.
16. E. Kim and B. S. Chun: Jpn. J. Appl. Phys. 43 (2004) 219.
17. T. Morita, T. Kanda, Y. Yamagata, M. Kurosawa and T. Higuchi: Jpn. J. Appl. Phys. 36 (1997) 2998.
18. T. Kanda, Y. Kobayashi, M. K. Kurosawa and T. Higuchi: Jpn. J. Appl. Phys. 42 (2003) 3014.
19. M. Ishikawa, M. K. Kurosawa, A. Endoh and S. Takeuchi: Jpn. J. Appl. Phys. 44 (2005) 4342.
20. B. T. Khuri-Yakub, C.-H. Cheng, F.-L. Degertekin, S. Ergun, S. Hansen, X.-C. Jin and O. Oralkan: Jpn. J. Appl. Phys. 39 (2000) 2883.
21. H. Nagahara, T. Hashida, M. Suzuki and M. Hashimoto; Jpn. J. Appl. Phys. 44 (2005) 4485.
22. T. Uno, S. Noge and H. Shimotori: Jpn, J. Appl. Phys. 44 (2005) 4336.
23. H. Tabata, T. Kawai and S. Kawai: Appl. Phys. Lett. 58 (1991) 1443.
24. H. Tabata, T. Kawai and S. Kawai: Phys. Rev. Lett. 70 (1993) 2633.
25. J. Im, O. Auciello, P. K. Baumann, S. K. Streiffer, D. Y. Kaufman and A. R. Krauss: Appl. Phys. Lett. 76 (2000) 625.
26. B. Nagaraj, T. Sawhney, S. Perusse, S. Aggarwal, R. Ramesh, V. S. Kaushik, S. Zafar, R. E. Jones, J.-H. Lee, V. Balu and J. Lee: Appl. Phys. Lett. 74 (1999) 3194.
27. T. Zhao, Z.-H. Chen, F. Chen, W.-S. Shi, H.-B. Lu and G.-Z. Yang: Phys. Rev. B 60 (1999) 1697.
28. J. Zhai, T. F. Hung and H. Chen: Appl. Phys. Lett. 85 (2004) 2026.
29. H. Tabata and T. Kawai: Appl. Phys. Lett. 70 (1997) 321.
30. H. Tabata, H. Tanaka and T. Kawai: Appl. Phys. Lett. 65 (1994) 1970.
31. P. F. Fewster: Rep. Prog. Phys. 59 (1996) 1339.