Experimental study of chemical reaction between LiF and polyflourene interface during sputtering indium-tin oxide cathode for top emission polymer light emitting devices

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 4 B, 2006, Pages 3742-3745

  Liu, K C ^a   Teng, C W ^a   Lee, C C ^a   Cheng, K Y ^a   Lu, Y H ^a   Liu, W T ^b   Chen, C C ^b   Chen, L C ^b  

^a CHANG GUNG UNIVERSITY   (Taiwan)

^b DELTA ELECTRONICS INC   (Taiwan)

Author keywords

Cathode; LiF; PLED; Temperature; Top emission; Transparent

Indexed keywords

CATHODES; CURRENT DENSITY; DIFFUSION; ELECTRIC POTENTIAL; HEAT TREATMENT; LITHIUM COMPOUNDS; PARTICLE BEAM INJECTION; SEMICONDUCTING INDIUM; SEMICONDUCTING TIN COMPOUNDS; SPUTTERING; TEMPERATURE DISTRIBUTION; X RAY PHOTOELECTRON SPECTROSCOPY;

LIF; OXIDE CATHODE; POLYMER LIGHT EMITTING DEVICES (PLEDS); TOP EMISSION; TRANSPARENT;

LIGHT EMITTING DIODES;

EID: 33646901856     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.3742     Document Type: Article

References (22)

1. D. Braun and A. J. Heeger: Appl. Phys. Lett. 58 (1991) 1982.
2. T. F. Guo, F. S. Yang and Z. J. Tsai: Appl. Phys. Lett. 87 (2005) 013504.
3. X. Y. Deng, W. M. Lau and K. Y. Wong: Appl. Phys. Lett. 84 (2004) 3522.
4. W. Song, S. K. So, K. W. Wong, W. K. Choi and Lili Cao: Appl. Surf. Sci. 228 (2004) 373.
5. K. Ihm, T. H. Kang, K. J. Kim, C. C. Hwang and Y. J. Park: Appl. Phys. Lett. 83 (2003) 2949.
6. J. Lee and Y. Park: Appl. Phys. Lett. 82 (2003) 173.
7. T. M. Brown and R. H. Friend: Appl. Phys. Lett. 77 (2000) 3096.
8. X. Y. Deng, W. M. Lau and K. Y. Wong: Appl. Phys. Lett. 84 (2004) 3522.
9. T. Ahn, H. Lee and S. H. Han: Appl. Phys. Lett. 80 (2002) 392.
10. T. W. Lee, O. O. Park, L. M. Do and T. Zyung: Synth. Met. 117 (2001) 249.
11. T. W. Lee and O. O. Park: Adv. Mater. 12 (2000) 801.
12. Y. H. Niu, Q. Hou and Y. Cao: Appl. Phys. Lett. 81 (2002) 634.
13. M. S. Xu and J. B. Xu: J. Phys. D 37 (2004) 1603.
14. J. Kim, J. Lee, C. W. Han, N. Y. Lee and I. J. Chung: Appl. Phys. Lett. 82 (2003) 4238.
15. B. H. Lee, I. G. Kim, S. W. Cho and S. H. Lee: Thin Solid Films 302 (1997) 25.
16. A. Antony, M. Nisha, R. Manoj and Jayaraj: Appl. Surf. Sci. 225 (2004) 294.
17. P. E. Burrows, Z. Shen, V. Bulovic, D. M. McCarty, S. R. Forrest, J. A. Cronin and M. E. Thompson: J. Appl. Phys. 79 (1995) 7991.
18. H. Heil, J. Steiger, S. Karg, M. Gastei, H. Ortner, H. Seggern and M. Stobel: J Appl. Phys. 89 (2001) 420.
19. T. Brown, R. Friend, I. Millard, D. Lacey, T. Butler, J. Burroughes and F. Caciallia: J. Appl. Phys. 93 (2003) 6159.
20. S. Shaheen, G. Jabbour, M. Morrell, Y. Kawabe, B. Kippelen, N. Peyghambarian, M. Nabor, R. Schlaf and N. Amstrong: J. Appl. Phys. 84 (1998) 2324.
21. Y. Kishigami, K. Tsubaki, Y. Kondo and J. Kido: Synth. Met. 153 (2005) 241.
22. Q. Xu, J. Ouyang, Y. Yang, T. Ito and J. Kido: Appl. Phys. Lett. 83 (2003) 4695.