Origin of room temperature ferromagnetism in ZnO:Cu films

Journal of Applied Physics

Volumn 99, Issue 8, 2006, Pages

  Herng, T S ^a   Lau, S P ^a   Yu, S F ^a   Yang, H Y ^a   Ji, X H ^a   Chen, J S ^b   Yasui, N ^c   Inaba, H ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b DATA STORAGE INSTITUTE   (Singapore)

^c HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; DOPING (ADDITIVES); FERROMAGNETISM; MAGNETIZATION; SILICON; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

FILTERED CATHODIC VACUUM ARC TECHNIQUES; ROOM TEMPERATURE; SILICON SUBSTRATES; ZN TARGETS;

THIN FILMS;

EID: 33646745324     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2190711     Document Type: Article

References (21)

1. T. Dietl, H. Ohno, F. Matsukura, J. Cibert, and D. Ferrand, Science 287, 1019 (2000).
2. K. Ueda, H. Tabata, and T. Kawai, Appl. Phys. Lett. 79, 988 (2001).
3. S. W. Jung, S.-J. An, G.-C. Yi, C. U. Jung, S.-I. Lee, and S. Cho, Appl. Phys. Lett. 80, 4561 (2002).
4. Z. Jin, Appl. Phys. Lett. 78, 3824 (2001).
5. A. S. Risbud, N. A. Spaldin, Z. Q. Chen, S. Stemmer, and R. Seshadri, Phys. Rev. B 68, 205202 (2003).
6. J. H. Shim, T. Hwang, S. Lee, J. H. Park, S.-J. Han, and Y. H. Jeong, Appl. Phys. Lett. 86, 082503 (2005).
7. H.-J. Lee, B.-S. Kim, C. R. Cho, and S.-Y. Jeong, Phys. Status Solidi B 241, 1533 (2004).
8. M. Wei, N. Braddon, D. Zhi, P. A. Midgley, S. K. Chen, M. G. Blamire, and J. L. MacManus-Driscoll, Appl. Phys. Lett. 86, 072514 (2005).
9. P. Fons, A. Yamada, K. Iwata, K. Matsubara, S. Niki, K. Nakahara, and H. Takasu, Nucl. Instrum. Methods Phys. Res. B 199, 190 (2003).
10. D. B. Buchholz, R. P. H. Chang, J. H. Song, and J. B. Ketterson, Appl. Phys. Lett. 87, 082504 (2005).
11. X. Feng, J. Phys.: Condens. Matter 16, 4251 (2004).
12. N. H. Hong, V. Brize, and J. Sakai, Appl. Phys. Lett. 86, 082505 (2005).
13. W. H. Brumage, C. F. Dorman, and C. R. Quade, Phys. Rev. B 63, 104411 (2001).
14. Y. G. Wang, S. P. Lau, H. W. Lee, S. F. Yu, B. K. Tay, X. H. Zhang, K. Y. Tse, and H. H. Hng, J. Appl. Phys. 94, 1597 (2003).
15. A. C. Mofor, Appl. Phys. Lett. 87, 062501 (2005).
16. S. J. Pearton, D. P. Norton, K. Ip, Y. W. Heo, and T. Steiner, Prog. Mater. Sci. 50, 293 (2005).
17. S. Kolesnik, B. Dabrowski, and J. Mais, J. Appl. Phys. 95, 2582 (2004).
18. J. M. D. Coey, J. Appl. Phys. 97, 1 (2005).
19. W. Wang, O. K. Varghese, C. Ruan, M. Paulose, and C. A. Grimes, J. Mater. Res. 18, 2756 (2003).
20. M. Scrocco, Chem. Phys. Lett. 63, 52 (1979).
21. T. C. Kaspar, Phys. Rev. Lett. 95, 217203 (2005).