Thickness effect in Pb(Zr 0.2 Ti 0.8 )O 3 ferroelectric thin films grown by pulsed laser deposition

Applied Surface Science

Volumn 252, Issue 13 SPEC. ISS., 2006, Pages 4549-4552

  Lisca, M ^a,b   Pintilie, L ^a,b   Alexe, M ^b   Teodorescu, C M ^a  

^a NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

Ferroelectric; Pulsed laser deposition; Thickness reduction

Indexed keywords

DEPOSITION; FERROELECTRIC DEVICES; FERROELECTRIC MATERIALS; LEAD; LEAKAGE CURRENTS; PULSED LASER DEPOSITION; SUBSTRATES;

ELECTRICAL CHARACTERIZATION; HYSTERESIS LOOPS; STRUCTURAL MISFIT; THICKNESS REDUCTION;

THIN FILMS;

EID: 33646591574     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.07.149     Document Type: Article

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