A GISAXS study of SiO/SiO2 superlattice

Thin Solid Films

Volumn 511-512, Issue , 2006, Pages 463-467

  Kovacevic I ^a   Pivac, B ^a   Dubcek P ^a   Radic N ^a   Bernstorff, S ^b   Slaoui, A ^c  

^a RUDER BO KOVI INSTITUTE   (Croatia)

^b SINCROTRONE TRIESTE   (Italy)

^c Faculté de Médecine   (France)

Author keywords

Grazing incidence small angle X ray scattering; Nanostructures; Silicon; SiO SiO2 superlattice; Solar cells

Indexed keywords

AMORPHOUS MATERIALS; EVAPORATION; GYRATORS; NANOSTRUCTURED MATERIALS; PHOTOVOLTAIC CELLS; SILICON COMPOUNDS; SUBSTRATES;

GRAZING-INCIDENCE SMALL-ANGLE X-RAY SCATTERING (GISAXS); INTER-PARTICLE DISTANCE; NANOCRYSTALS; PHOTOVOLTAIC CONVERSION;

SUPERLATTICES;

EID: 33646576868     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.028     Document Type: Article

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