Atmospheric pressure plasma analysis by modulated molecular beam mass spectrometry

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 3, 2006, Pages 550-553

  Gonzalvo, Y Aranda ^a   Whitmore, T D ^a   Rees, J A ^a   Seymour, D L ^a   Stoffels, E ^b  

^a HIDEN ANALYTICAL LTD   (United Kingdom)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; DATA ACQUISITION; IONIZATION; MASS SPECTROMETERS; MOLECULAR BEAMS; NITROGEN OXIDES;

FRACTIONAL NUMBER DENSITY MEASUREMENTS; MOLECULAR BEAM MASS SPECTROMETER (MBMS) SYSTEM; NITRIC OXIDE;

PLASMAS;

EID: 33646571226     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2194938     Document Type: Article

References (20)

1. J. R. Roth, Industrial Plasma Engineering: Applications to Nonthermal Plasma Processing (IOP, Bristol and Philadelpia, 2001).
2. M. J. Shenton and G. C. Stevens, J. Phys. D 34, 2761 (2001).
3. G. S. Selwyn, H. W. Herrmann, J. Park, and I. Henins, Contrib. Plasma Phys. 41, 610 (2001).
4. M. Noeske, J. Degenhardt, S. Strudthoff, and U. Lommatzsch, Int. J. Adhes. Adhes. 24, 171 (2004).
5. S. Pane, R. Tedesco, and R. Greger, J. Ind. Text. 31, 135 (2001).
6. P. Sunka, Phys. Plasmas 8, 2587 (2001).
7. J. R. Roth, D. M. Sherman, R. B. Gadri, F. Karakaya, Z. Chen, T. C. Montie, and K. Kelly-Winterberg, IEEE Trans. Plasma Sci. 28, 56 (2000).
8. M. Laroussi, G. S. Sayler, B. B. Glascock, B. McCurdy, M. E. Pearce, N. G. Bright, and C. M. Malott, IEEE Trans. Plasma Sci. 27, 34 (1999).
9. E. Stoffels, A. J. Flikweert, W. W. Stoffels, and G. M. W. Kroesen, Plasma Sources Sci. Technol. 11, 383 (2002).
10. I. E. Kieft, J. L. V. Broers, V. Caubet-Hilloutou, F. C. S. Ramaekers, D. W. Slaaf, and E. Stoffels, Bioelectromagnetics (N.Y.) 25, 362 (2004).
11. R. E. J. Sladek, E. Stoffels, R. Walraven, P. J. A. Tielbeek, and R. A. Koolhoven, IEEE Trans. Plasma Sci. 32, 1540 (2004).
12. I. E. Kieft, J. J. B. N. Van Berkel, E. R. Kieft, and E. Stoffels, Plasma Proc. Polym. 1, 295 (2005).
13. D. Dayton and W. Frederick, Energy Fuels 10, 284 (1996).
14. H. Singh, J. W. Coburn, and D. B. Graves, J. Vac. Sci. Technol. A 17, 2447 (1999).
15. S. Agarwal, G. W. W. Quax, M. C. M. Van de Sanden, D. Maroudas, and E. S. Aydil, J. Vac. Sci. Technol. A 22, 71 (2004).
16. C. A. Rego, R. S. Tsang, P. W. May, M. N. R. Asfold, and K. N. Rosser, J. Appl. Phys. 79, 7264 (1996).
17. P. Kae-Nune, J. Perrin, J. Guillon, and J. Jolly, Jpn. J. Appl. Phys., Part 1 33, 4303 (1994).
18. M. Laroussi, Second International Workshop on Cold Atmospheric Pressure Plasmas: Sources and Applications, Bruges, Belgium, 2005 (unpublished), p. 18.
19. M. Moisan, B. Saoudi, M. C. Crevier, N. Philip, E. Farard, J. Barbeau, and J. Pelletier, Fifth International Workshop on Microwaves Discharges, Greifswald, Germany, 2003 (unpublished), p. 18.
20. R. E. Klabunde, Cardiovascular Physiology Concepts (Lippincott, New York, 2004), http://www.oucom.ohiou.edu/cvphysiology/BF011.htm.