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Contributions to Plasma Physics

Volumn 41, Issue 6, 2001, Pages 610-619

Materials processing using an atmospheric pressure, RF-generated plasma source

(4) Selwyn, G S a Herrmann, H W a Park, J a Henins, I a

a LOS ALAMOS NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CHEMICAL EQUIPMENT; CHEMICAL MODIFICATION; SURFACE TREATMENT; TEMPERATURE; VACUUM APPLICATIONS;

% REDUCTIONS; ACTIVE CHEMICALS; CAPITALS COSTS; CHEMICAL SPECIES; HIGH PRESSURE; HIGH-LOW; LOW TEMPERATURE PLASMAS; MATERIALS PROCESSING; PLASMA PROCESS; VACUUM COMPATIBILITY;

PLASMA SOURCES;

EID: 0035730887 PISSN: 08631042 EISSN: None Source Type: Journal
DOI: 10.1002/1521-3986(200111)41:6<610::AID-CTPP610>3.0.CO;2-L Document Type: Article

Times cited : (122)

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