Temperature effect on structure and surface morphology of indium tin oxide films deposited by reactive ion-beam sputtering

Vacuum

Volumn 80, Issue 7 SPEC. ISS., 2006, Pages 708-711

  Iwatsubo, S ^a  

^a TOYAMA INDUSTRIAL TECHNOLOGY CENTER   (Japan)

Author keywords

Film; Ion beam; ITO; Reactive sputtering; Temperature

Indexed keywords

ETCHING; INDIUM COMPOUNDS; ION BEAMS; REACTIVE ION ETCHING; SURFACE STRUCTURE; THERMAL EFFECTS;

ANNEALING TEMPERATURE; POLYCRYSTALLINE FILMS; REACTIVE SPUTTERING; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 33646559579     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.11.035     Document Type: Article

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