Growth of oxide thin films for optical gas sensor applications

Applied Surface Science

Volumn 252, Issue 13 SPEC. ISS., 2006, Pages 4582-4586

  Caiteanu, D ^a   Gyorgy E ^a   Grigorescu, S ^a   Mihailescu, I N ^a   Prodan, G ^b   Ciupina, V ^b  

^a INSTITUTE OF ATOMIC PHYSICS   (Romania)

^b OVIDIUS UNIVERSITY   (Romania)

Author keywords

Optical gas sensors; Pulsed laser deposition; Thin films

Indexed keywords

CRYSTALS; EXCIMER LASERS; IRRADIATION; LASER APPLICATIONS; NANOSTRUCTURED MATERIALS; OPTICAL RESOLVING POWER; SENSORS; SPECTRUM ANALYZERS; THIN FILMS; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN COMPOUNDS;

OPTICAL GAS SENSOR; SENSOR APPLICATIONS; TETRAGONAL ANATASE PHASE; TRANSMITTANCE;

CHEMICAL SENSORS;

EID: 33646553060     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.07.081     Document Type: Article

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