Deoxidization of Cu oxide under extremely low oxygen pressure ambient

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 45, Issue 12-16, 2006, Pages

  Endo, Kazuhiko ^a   Shirakawa, Naoki ^a   Yoshida, Yoshiyuki ^a   Ikeda, Shin Ichi ^a   Mlno, Tetsuya ^a   Gofuku, Eishi ^a   Suzuki, Eiichi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Cleaning; Cu oxide; Deoxidization; Extremely low oxygen partial pressure; Solid electrolyte; Zirconia

Indexed keywords

OXYGEN; PARTIAL PRESSURE; PRESSURE EFFECTS; REDUCTION; SURFACE CLEANING; ZIRCONIA;

DEOXIDIZATION; EXTREMELY LOW OXYGEN PARTIAL PRESSURE; OXYGEN REDUCTION SYSTEM (ORS); SOLID ELECTROLYTE;

COPPER OXIDES;

EID: 33646473730     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.L393     Document Type: Article

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