X-ray photoelectron spectroscopy and Auger electron spectroscopy investigation on the oxidation resistance of plasma-treated copper leadframes

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 II, 2000, Pages 1619-1631

  Wong, A S W ^a   Gopal Krishnan, R ^b   Sarkar, G ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BINDING ENERGY; COMPOSITION EFFECTS; OXIDATION RESISTANCE; PLASMA APPLICATIONS; PYROLYSIS; SURFACE CHEMISTRY; SURFACE TREATMENT; THERMOOXIDATION; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL SHIFT; PLASMA TREATMENT;

COPPER;

EID: 0010642934     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582396     Document Type: Article

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