Erratum to "Analysis of vertical cracking phenomena in tensile-strained epitaxial film on a substrate: Part I. Mathematical formulation" [International Journal of Solids and Structures 43 (2006) 3401-3413] (DOI:10.1016/j.ijsolstr.2005.05.002);Analysis of vertical cracking phenomena in tensile-strained epitaxial film on a substrate: Part I. Mathematical formulation

International Journal of Solids and Structures

Volumn 43, Issue 11-12, 2006, Pages 3401-3413

  Lee, S ^a   Choi, S T ^b   Earmme, Y Y ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

Anisotropic elasticity; Channeling crack; Continuous distributions of dislocations; Critical condition for crack formation; Epitaxial film substrate system; Vertical crack

Indexed keywords

ANISOTROPY; CRACKING (CHEMICAL); EPITAXIAL GROWTH; GREEN'S FUNCTION; INTEGRAL EQUATIONS; STRAIN; SUBSTRATES; TENSILE STRESS; THICKNESS CONTROL;

ANISOTROPIC ELASTICITY; CHANNELING CRACK; CONTINUOUS DISTRIBUTIONS OF DISLOCATIONS; CRITICAL CONDITION FOR CRACK FORMATION; EPITAXIAL FILM/SUBSTRATE SYSTEM; VERTICAL CRACK;

THIN FILMS;

EID: 33646468538     PISSN: 00207683     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijsolstr.2007.04.027     Document Type: Erratum

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