Silicon oxide thin film deposition on alumina in a circulating fluidized bed reactor

Key Engineering Materials

Volumn 277-279, Issue I, 2005, Pages 577-582

  Park, Sang Min ^a   Jung, Soon Hwa ^b   Park, Soung Hee ^c   Kim, Sang Done ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b LG Chemical Ltd   (South Korea)

^c Woosuk University   (South Korea)

Author keywords

Atmospheric pressure; Circulating fluidized bed; CVD; HMDSO; Plasma; Powder; TEOS

Indexed keywords

ALUMINA; ATMOSPHERIC PRESSURE; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; FLUIDIZED BEDS; HYDROPHILICITY; HYDROPHOBICITY; POWDERS; SILICA;

CIRCULATING FLUIDIZED BED; FLUIDIZED BED REACTORS; HMDSO; TEOS;

THIN FILMS;

EID: 33646459017     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/0-87849-958-x.577     Document Type: Article

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