Dissolution kinetics of WO3 in acidic solutions

Journal of Applied Electrochemistry

Volumn 36, Issue 5, 2006, Pages 603-608

  Anik, Mustafa ^a   Cansizoglu, Tuba ^a  

^a ESKISEHIR OSMANGAZI UNIVERSITY   (Turkey)

Author keywords

CMP; Dissolution kinetics; Rate constant; Tungsten; Tungsten oxide

Indexed keywords

DISSOLUTION; ELECTROCHEMICAL ELECTRODES; PH; RATE CONSTANTS; REACTION KINETICS; TUNGSTEN;

CMP; DISSOLUTION KINETICS; TUNGSTEN OXIDE;

TUNGSTEN COMPOUNDS;

EID: 33646417375     PISSN: 0021891X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10800-006-9113-3     Document Type: Article

References (30)

1. J.M. Steigerwald, S.P. Murarka and R.J. Gutmann, Chemical Mechanical Planarization of Microelectronic Materials (Wiley, New York, 1997). p. 1.
2. F.B. Kaufman, D.B. Thompson, R.E. Broadie, M.A. Jaso, W.L. Guthrie, D.J. Pearson and M.B. Small, J. Electrochem. Soc. 138 (1991) 3460.
3. E.A. Kneer, C. Raghunath, S. Raghavan and J.S. Jeon, J. Electrochem. Soc. 143 (1996) 4095.
4. S. Basak, K. Mishra, B. Withers and K. Rajeshwar, in S. Raghavan and F. Ali (Eds), First Int. Symp. Chemical Mechanical Planarization, Vol. 96-22 (Electrochem. Soc. Proc., Pennington, NJ, 1997) p. 137.
5. C. Raghunath, K.T. Lee, E.A. Kneer, V. Mathew and S. Raghavan, in S. Raghavan and I. Ali (Eds), First Int. Symp. Chemical Mechanical Planarization, Vol. 96-22 (Electrochem. Soc. Proc., Pennington, NJ, 1997) p. 1.
6. E.A. Kneer, C. Raghunath, V. Mathew, S. Raghavan and J.S. Jeon, J. Electrochem. Soc. 144 (1997) 3041.
7. D.J. Stein, D. Hetherington, T. Guilinger and J.L. Cecchi, J. Electrochem. Soc. 145 (1998) 3190.
8. D.J. Stein, D. Hetherington and J.L. Cecchi, J. Electrochem. Soc. 146 (1999) 376.
9. D. Tamboli, S. Seal and V. Desai, J. Vac. Sci. Technol. A17 (1999) 1168.
10. J.W. Johnson and C.L. Wu, J. Electrochem. Soc. 118 (1971) 1909.
11. T. Heumann and N. Stolica, Electrochim. Acta 16 (1971) 1635.
12. R.D. Armstrong, K. Edmonson and R.E. Firman, J. Electroanal. Chem. 40 (1972) 19.
13. M.R. Arora and R. Kelly, Electrochim. Acta 19 (1974) 413.
14. M.R. Arora and R. Kelly, J. Eleclrochem. Soc. 124 (1977) 1493.
15. F. Di Quarto. A. Di Paola and C. Sunseri, J. Electrochem. Soc. 127 (1980) 1016.
16. F. Di Quarto, A. Di Paola and C. Sunseri, Electrochim. Acta 26 (1981) 1177.
17. R.S. Lillard, G.S. Kanner and D.P. Butt, J. Electrochem. Soc. 145 (1998) 2718.
18. J.W. Van Put, W.P.C. Duyvesteyn and F.G.J. Luger, Hydrometallurgy 26 (1991) 1.
19. J.W. Van Put and P.M. De Koning, Hydrometallurgy 28 (1992) 353.
20. M. Anik and K. Osseo-Asare, J. Electrochem. Soc. 149 (2002) B224.
21. M. Anik, T. Cansizoglu and S. Cevik, Turk. J. Chem. 28 (2004) 425.
22. Yu.V. Pleskov and V.Yu. Filinovskii, The Rotating Disc Electrode (Plenum, New York, 1976), p. 1.
23. A.J. Bard and L.R. Faulkner, Electrochemical Methods Fundamentals and Applications, 2nd edn., (John Wiley, New York, 2001), p. 331.
24. G.A. Parks, Chem. Rev. 65 (1965) 177.
25. D.D. Macdonald, E. Sikora and J. Sikora, Electrochim. Acta 43 (1998) 2851.
26. S.M. Ahmed, in J.W. Diggle (Ed), 'Oxides and Oxide Films', Vol. 1, (Marcel Dekker, New York, 1972) p. 319.
27. W. Stumm, Chemistry of the Solid - Water Interface (John Wiley, New York. 1992), p. 157.
28. D.J. O'Connor, P.G. Johansen and A.S. Buchanan, Trans. Faraday Soc. 52 (1956) 229.
29. M. Robinson, J.A. Pask and D.W. Fuerstenau, J. Am. Ceram. Soc. 47 (1964) 516.
30. M. Metikos-Hukovic and Z. Grubac, J. Electroanal. Chem. 556 (2003) 167.