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Volumn 892, Issue , 2006, Pages 723-727
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Microstructure and strain-free lattice parameters of ScxGa 1-xN films
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Author keywords
[No Author keywords available]
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Indexed keywords
AMMONIA;
CONCENTRATION (PROCESS);
FILM GROWTH;
LATTICE CONSTANTS;
MICROSTRUCTURE;
MOLECULAR BEAM EPITAXY;
SEMICONDUCTING GALLIUM COMPOUNDS;
X RAY DIFFRACTION ANALYSIS;
HIGH-RESOLUTION X-RAY DIFFRACTION (HRXRD);
IN SITU ELASTIC TESTER;
LATTICE PARAMETER RATIO;
STRAIN-FREE LATTICE PARAMETERS;
SEMICONDUCTING FILMS;
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EID: 33646386161
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (2)
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References (15)
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