High-temperature interstitial oxygen diffusion retardation in epitaxial-layered heavily arsenic- or boron-doped Czochralski silicon wafers

Applied Physics Letters

Volumn 88, Issue 15, 2006, Pages

  Wang, Q ^a   Ho, Ihsiu ^a  

^a FAIRCHILD SEMICONDUCTOR   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC SUBSTRATE; CZOCHRALSKI SILICON WAFERS; DIFFUSION RETARDATION;

ARSENIC; BORON; DIFFUSION; DOPING (ADDITIVES); EPITAXIAL GROWTH; HIGH TEMPERATURE APPLICATIONS; OXYGEN;

SILICON WAFERS;

EID: 33646148471     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2195099     Document Type: Article

References (15)

1. T. Y. Tan and W. J. Taylor, Semicond. Semimetals 42, 353 (1994).
2. S.-T. Lee and D. Nichols, Mater. Res. Soc. Symp. Proc. 59, 31 (1986).
3. J. C. Mikkelsen, Jr. in Oxygen, Carbon, Hydrogen and Nitrogen in Crystal Silicon, edited by, S. J. Pearton, J. W. Corbett, and, S. J. Pennycock, (Materials Research Society, Pittsburgh, 1986) p. 19.
4. H. Takeno, K. Sunakawa, and M. Suezawa, Appl. Phys. Lett. 77, 376 (2000).
5. T. Ono, G. Rozgonyi, E. Asayama, H. Horie, H. Tsuya, and K. Sueoka, Appl. Phys. Lett. 74, 3648 (1999).
6. U. Gösele and T. Y. Tan, in Impurity Diffusion and Gettering in Silicon, edited by, R. B. Fair, C. Pearce, and, J. Washburn, (Materials Research Society, Pittsburgh, 1985), p. 105.
7. G. Hong, Q. Wang, and F. Liu, Phys. Rev. B (to be published).
8. Q. Wang, M. Daggubatti, R. Yu, and X. F. Zhang, Mater. Res. Soc. Symp. Proc. 864, E9.18.1 (2005).
9. Y. Murakami, Y. Satoh, H. Furuya, and T. Shingyouji, J. Appl. Phys. 84, 3175 (1998).
10. Q. Wang, M. Daggubatti, H. Paravi, R. Yu, and X. F. Zhang, J. Vac. Sci. Technol. A (to be published).
11. A. Karoui, F. S. Karoui, A. Kvit, R. A. Rozgonyi, and D. Yang, J. Appl. Phys. 96, 3225 (2004).
12. Y. Sugita and M. Tamura, J. Appl. Phys. 40, 3089 (1969).
13. J. C. Bean, in Silicon Molecular Beam Epitaxy, edited by, E. Kaser, and, J. C. Bean, (CRC, Boca Raton, FL, 1988).
14. F. R. N. Nabaro, Theory of Crystal Dislocations (Oxford University Press, Oxford, UK, 1967).
15. K. Sumino and I. Yonenaga, Semicond. Semimetals 42, 450 (1994).