Adhesion improvement of ArF resist pattern depending on BARC material

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 659-662

  Kawai, Akira ^a   Moriuchi, Takahiro ^a   Niiyama, Takayoshi ^a   Kishioka, Takahiro ^b   Maruyama, Daisuke ^b   Sakaida, Yasushi ^b   Matsumoto, Takashi ^b  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

^b NISSAN CHEMICAL INDUSTRIES LTD   (Japan)

Author keywords

Adhesion; Atomic force microscopy; BARC; DPAT method; Interface deformation; Interface interaction; Pattern collapse; Roughness

Indexed keywords

ADHESION; ARGON; ATOMIC FORCE MICROSCOPY; DEFORMATION; MICROELECTRONICS; SURFACE ROUGHNESS;

BARC; DPAT METHOD; INTERFACE DEFORMATION; INTERFACE INTERACTION; PATTERN COLLAPSE;

ANTIREFLECTION COATINGS;

EID: 33646067764     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.12.030     Document Type: Article

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