Collapse behavior of KrF resist line pattern analyzed with atomic force microscope tip

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 7044-7048

  Kawai, Akira ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Adhesion; Atomic force microscopy; Cohesion; Collapse; Crack; Destruction; Finite element method; Internal stress; KrF excimer laser; Lithography; Residue; Resist

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; CRACK PROPAGATION; EDGE DETECTION; EXCIMER LASERS; FINITE ELEMENT METHOD; GAS LASERS; INTERFACES (MATERIALS); RESIDUAL STRESSES; STRESS CONCENTRATION; SUBSTRATES;

RESIST-SUBSTRATE INTERFACES;

PHOTORESISTS;

EID: 0034428023     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.7044     Document Type: Article

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