Analysis of pattern collapse of ArF excimer laser resist by direct peeling method with atomic force microscope tip

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 683-692

  Kawai, A ^a   Moriike, N ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Adhesion; Atomic force microscope; Collapse; Fracture; Lithography; Polymer; Resist

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; EXCIMER LASERS; FRACTURE; POLYMERS; STRESS CONCENTRATION; SUBSTRATES;

PATTERN COLLAPSE;

PHOTORESISTS;

EID: 0035450723     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00452-X     Document Type: Conference Paper

References (14)