Cohesion property of resist pattern surface analyzed by tip indentation method

Journal of Photopolymer Science and Technology

Volumn 17, Issue 3, 2004, Pages 441-448

  Kawai, Akira ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Atomic force microscope; Condensation; Polymer aggregate; Surface hardened layer; Tip indentation method

Indexed keywords

ANALYTIC METHOD; ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTRON BEAM; HARDNESS; IRRADIATION; POLYMERIZATION; QUANTITATIVE ANALYSIS; SURFACE PROPERTY; TECHNIQUE; THERMAL ANALYSIS; TIP INDENTATION METHOD;

EID: 3142592242     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.441     Document Type: Article

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