Fabrication of high frequency and low-cost surface-acoustic wave filters using near field phase shift photolithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1407-1409

  Lai, Fu Der ^a   Huang, H M ^a  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

Author keywords

Narrow gap structure; Near field phase shift photolithography; Surface acoustic wave filter

Indexed keywords

ELECTRONIC PROPERTIES; MODEMS; NATURAL FREQUENCIES; PHASE SHIFT; PHOTOLITHOGRAPHY; REMOTE CONTROL;

NARROW GAP STRUCTURE; NEAR FIELD PHASE SHIFT PHOTOLITHOGRAPHY; SURFACE-ACOUSTIC WAVE FILTER;

ACOUSTIC SURFACE WAVE FILTERS;

EID: 33646046841     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.106     Document Type: Article

References (5)

1. Rogers J.A., Paul K.E., Jackman R.J., and Whitesides G.M. J. Vac. Sci. Technol. B 16 (1998) 59
2. Available from: .
3. Engan H. IEEE Trans. Electron. Dev. 16 (1969) 1014
4. Kim Y.H., Park J.H., Lee K.H., Choi S.W., Yoon H.S., and Sohn J.M. SPIE 3748 (1999) 332
5. Hesjedal T., and Seidel W. Nanotechnology 14 (2003) 91-94