Fabrication of three-dimensional microlens arrays in sol-gel glass

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1329-1332

  Orhan, J B ^a   Parashar, V K ^a   Sayah, A ^a   Gijs, M A M ^a  

^a EPFL   (Switzerland)

Author keywords

High aspect ratio; Microlens array; Photoresist reflow; Replication technology; Sol gel process

Indexed keywords

ARRAYS; ASPECT RATIO; GLASS; MICROELECTRONICS; PHOTORESISTS; SOL-GELS;

MICROLENS ARRAY; PHOTORESIST REFLOW; REPLICATION TECHNOLOGY; SOL-GEL PROCESS;

MICROLENSES;

EID: 33646029995     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.045     Document Type: Article

References (13)

1. Yang H.H., Chao C.K., Wei M.K., and Lin C.P. J. Micromech. Microeng. 14 (2004) 1197
2. Volkel R., Herzig H.P., Nussbaum P., Dandliker R., and Hugle W.B. Opt. Eng. 35 (1996) 3323
3. Artzner G. Opt. Eng. 31 (1992) 1311
4. Fujita T., Nishihara H., and Koyama J. Opt. Lett. 6 (1981) 613
5. Daly D., Stevens R.F., Hutley M.C., and Davies N. Meas. Sci. Technol. 1 (1990) 759
6. Kufner M., and Kufner S. Microsyst. Technol. 2 (1996) 114
7. Severi M., and Mottier P. Opt. Eng. 38 (1999) 146
8. Ishii Y., Koike S., Arai Y., and Ando Y. Jpn. J. Appl. Phys. 39 (2000) 1490
9. Shen X.-J., Pan L.-W., and Lin L. Sensor. Actuat. A 97-98 (2002) 428
10. Popovic Z.D., Sprague R.A., and Connell G.A.N. Appl. Opt. 27 (1988) 1281
11. Marzolin C., Smith S.P., Prentiss M., and Whitesides G.M. Adv. Mater. 10 (1998) 571
12. Xia Y., and Whitesides G.M. Annu. Rev. Mater. Sci. 28 (1998) 153
13. Parashar V.K., Sayah A., Pfeffer M., Schoch F., Gobrecht J., and Gijs M.A.M. Microelectron. Eng. 67-68 (2003) 710