TEM and nanoindentation studies on sputtered Ti40Ni60 thin films

Materials Chemistry and Physics

Volumn 97, Issue 2-3, 2006, Pages 308-314

  Nanda Kumar, A K ^a   Sasidharan Nair, C K ^a   Kannan, M D ^a   Jayakumar, S ^a  

^a PSG COLLEGE OF TECHNOLOGY   (India)

Author keywords

Austenite phase; Hardness; Nanoindentation; Oliver Pharr analysis; Thin film; TiNi shape memory alloy; Young's modulus

Indexed keywords

AMORPHOUS FILMS; ANNEALING; ELASTIC MODULI; ELECTRON DIFFRACTION; ELECTRON MICROSCOPY; HARDNESS; SEGREGATION (METALLOGRAPHY); SPUTTERING; SUPERLATTICES; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY;

(P-H) CURVES; AUSTENITE PHASE; HYSITRON TRIBOINDENTER; MECHANICAL RESPONSE; NANOINDENTATION; OLIVER-PHARR ANALYSIS; TINI SHAPE MEMORY ALLOY;

THIN FILMS;

EID: 33645883238     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2005.08.020     Document Type: Article

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