Influence of electric field intensity, ionic strength, and migration distance on the mobility and diffusion in DNA surface electrophoresis

Electrophoresis

Volumn 27, Issue 7, 2006, Pages 1312-1321

  Li, Bingquan ^a   Fang, Xiaohua ^a   Luo, Haobin ^a   Petersen, Eric ^b   Seo, Young Soo ^a,d   Samuilov, Vladimir ^a   Rafailovich, Miriam ^a   Sokolov, Jonathan ^a   Gersappe, Dilip ^a   Chu, Benjamin ^c  

^a Stony Brook University   (United States)

^b HARVARD UNIVERSITY   (United States)

^c STONY BROOK UNIVERSITY   (United States)

^d LG Chemical Ltd   (South Korea)

Author keywords

Diffusion; DNA; Mobility; Surface electrophoresis

Indexed keywords

BIOINFORMATICS; CHAINS; DIFFUSION; ELECTRIC FIELDS; ELECTROPHORESIS; GENES; IONIC STRENGTH; MOLECULAR DYNAMICS;

DNA CHAINS; ELECTRIC FIELD INTENSITIES; FIELD INTENSITY; GENOMIC DNA; IONIC-MIGRATION; MIGRATION DISTANCE; MOBILITY; PEAK WIDTHS; SEPARATION RATE; SURFACE ELECTROPHORESIS;

DNA;

BUFFER; DNA; GENOMIC DNA; SILICON;

ADSORPTION; ARTICLE; CONTROLLED STUDY; DIFFUSION; DNA CONFORMATION; ELECTRIC FIELD; ELECTROPHORESIS; FLUORESCENCE MICROSCOPE; IONIC STRENGTH; MOLECULAR DYNAMICS; MOTION; SIMULATION; SURFACE PROPERTY;

EID: 33645814430     PISSN: 01730835     EISSN: 15222683     Source Type: Journal    
DOI: 10.1002/elps.200500444     Document Type: Article

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