Control of the ZnO nanowires nucleation site using microfluidic channels

Journal of Physical Chemistry B

Volumn 110, Issue 9, 2006, Pages 3856-3859

  Lee, Sang Hyun ^a   Lee, Hyun Jung ^a   Oh, Dongcheol ^b   Lee, Seog Woo ^a   Goto, Hiroki ^a   Buckmaster, Ryan ^b   Yasukawa, Tomoyuki ^a   Matsue, Tomokazu ^a   Hong, Soon Ku ^c   Ko, Hyunchui ^d   Cho, Meoung Whan ^a,b   Yao, Takafumi ^a,b  

^a TOHOKU UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c Chungnam National University   (South Korea)

^d University of South Alabama   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; PARAFFINS; SILICON; SUBSTRATES; THERMAL EFFECTS; ZINC OXIDE;

MICROFLUIDIC CHANNEL; OPTOELECTRIC DEVICES; PHOTOCURRENT PROPERTIES; SILICON SUBSTRATE;

NANOSTRUCTURED MATERIALS;

EID: 33645774972     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp056915n     Document Type: Article

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