Corrosion behaviour of electrodeposited and sputtered Cr coatings and sputtered Ta coatings with α and β phases

Surface and Coatings Technology

Volumn 200, Issue 20-21, 2006, Pages 5767-5777

  Maeng, S ^a   Axe, L ^a   Tyson, T A ^b   Cote, P ^c  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^c US Army ARDEC   (United States)

Author keywords

Chromium coating; Corrosion behaviour; Electrochemical impedance spectroscopy; Magnetron sputtering; Tantalum coating; X ray absorption spectroscopy

Indexed keywords

ABSORPTION SPECTROSCOPY; CHROMIUM; COATING TECHNIQUES; CURRENT DENSITY; DEGRADATION; DISSOLUTION; ELECTRODEPOSITION; MAGNETRON SPUTTERING; TANTALUM;

CHROMIUM COATING; CORROSION BEHAVIOUR; TANTALUM COATING; X-RAY ABSORPTION SPECTROSCOPY;

CORROSION RESISTANCE;

ABSORPTION SPECTROSCOPY; CHROMIUM; COATING TECHNIQUES; CORROSION RESISTANCE; CURRENT DENSITY; DEGRADATION; DISSOLUTION; ELECTRODEPOSITION; MAGNETRON SPUTTERING; TANTALUM;

EID: 33645772471     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.08.129     Document Type: Article

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