Characteristics of graded TiO2 and TiO2/ITO films prepared by twin DC magnetron sputtering technique

Surface and Coatings Technology

Volumn 200, Issue 20-21, 2006, Pages 6030-6036

  Wu, Kee Rong ^a   Ting, Chieh Hung ^a   Wang, Jin Jen ^a   Liu, Wu Chien ^b   Lin, Chao Hsien ^b  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

^b METAL INDUSTRIES RESEARCH AND DEVELOPMENT CENTRE   (Taiwan)

Author keywords

Annealing; Graded TiO2 films; Hardness; Twin DC magnetron sputtering

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; FILM PREPARATION; HARDNESS; MORPHOLOGY; SURFACE ROUGHNESS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

GRADED TITANIUM DIOXIDE FILMS; TWIN DC MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING;

ANNEALING; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; FILM PREPARATION; HARDNESS; MAGNETRON SPUTTERING; MORPHOLOGY; SURFACE ROUGHNESS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33645766271     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.09.031     Document Type: Article

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