Structural analysis of TiO2 films grown using microwave-activated chemical bath deposition

Thin Solid Films

Volumn 419, Issue 1-2, 2002, Pages 65-68

  Fernandez Lima F ^a   Baptista, D L ^b   Zumeta, I ^c   Pedrero, E ^c   Prioli, R ^d   Vigil, E ^c   Zawislak, F C ^b  

^a Institute of Nuclear Science   (Cuba)

^b FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^c UNIVERSITY OF HAVANA   (Cuba)

^d PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

Author keywords

Atomic force microscopy; Chemical bath deposition; Ion beam analysis; Microwave heating; TiO2 thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; ION BEAMS; MICROWAVE HEATING; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE PROPERTIES; TITANIUM DIOXIDE;

CHEMICAL BATH DEPOSITIONS;

THIN FILMS;

EID: 0036850895     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00780-0     Document Type: Article

References (18)

1. Burnside S.D., Marbé C., Comte P., Arendse F., Brooks K., Gratzel M. Chem. Mater. 10:1998;2419.
2. Sawunyama P., Yasurnori A., Okada K. Mater. Res. Bull. 33:1998;795.
3. Deki S., Aoi Y. J. Mater. Res. 13:1995;553.
4. Pulker H.K. Thin Solid Films. 34:1976;343.
5. Meng L., dos Santos M.P. Appl. Surf. Sci. 68:1993;319.
6. Aradakani H.K. Thin Solid Films. 248:1994;234.
7. Lee W.G., Woo S.I., Kim J.C., Choi S.H., Oh K.H. Thin Solid Films. 237:1994;105.
8. Kim E.K., Son M.H., Min S.K., Han Y.K., Wang C.H., Yom S.S. J. Appl. Phys. 79:1996;4459.
9. Aarik J., Aidla A., Sammelselg V., Ukstare T. J. Cryst. Growth. 181:1997;259.
10. Yuan J., Tsujikawa S. J. Electrochem. Soc. 142:1995;3444.
11. Paranjape D.V., Sastry M., Ganguly P. Appl. Phys. Lett. 63:1993;18.
12. Yin S., Inoue Y., Uchida S., Fujitsu Y., Sato T., Inoue J. Mater. Res. 13:1998;844.
13. Vigil E., Saadoun L., Rodriguez-Clemente R., Ayllón J.A., Dorménech X. J. Mater. Sci. Lett. 18:1999;1067.
14. Vigil E., Saadoun L., Ayllón J.A., Doménech X., Zumeta I., Rodríguez-Clemente R. J. Thin Solid Films. 365:2000;12-18.
15. Vigil E., Ayllón J.A., Peiró A.M., Rodríguez-Clemente R., Doménech X., Peral J. Langmuir. 17:2001;891-896.
16. Doolitle L.R. Nucl. Inst. Meth. Phys. Res. B. 9:1985;344.
17. Metzner H., Gossla M., Hahn Th. Nucl. Inst. Meth. Phys. Res. B. 124:1997;567-574.
18. Metzner H., Hahn Th., Gossla M., Conrad J., Bremer J.H. Nucl. Inst. Meth. Phys. Res. B. 134:1998;246-261.