Electrical characteristics of liquid-phase-deposited TiO2 films on GaAs substrate with (NH4)2 Sx treatment

Journal of the Electrochemical Society

Volumn 153, Issue 5, 2006, Pages

  Lee, Ming Kwei ^a   Yen, Chih Feng ^a   Huang, Jung Jie ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; LEAKAGE CURRENTS; PERMITTIVITY; SEMICONDUCTING GALLIUM ARSENIDE; TITANIUM DIOXIDE;

HEXAFLUOROTITANIC ACID; INTERFACE STATE DENSITY; OXIDE CHARGES; TITANIUM OXIDE FILMS;

THIN FILMS;

EID: 33645692141     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2181438     Document Type: Article

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