Ti/Au ohmic contacts to Al-doped n-ZnO grown by pulsed laser deposition

Journal of the Electrochemical Society

Volumn 153, Issue 5, 2006, Pages

  Chen, J J ^a,b   Anderson, T J ^a,b   Jang, S ^a,b   Ren, F ^a,b   Li, Y J ^a   Kim, H S ^a   Gila, B P ^a,b   Norton, D P ^a,b   Pearton, S J ^a,b  

^a University of Florida   (United States)

^b ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT RESISTIVITY; DOPING LEVELS; N-ZNO; TI/AU OHMIC CONTACTS;

ALUMINUM; ANNEALING; DIFFUSION; DOPING (ADDITIVES); GOLD; PULSED LASER DEPOSITION; TITANIUM; ZINC OXIDE;

OHMIC CONTACTS;

EID: 33645673183     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2184047     Document Type: Article

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