Electrical conductivity of high aspect ratio trenches in chemical-vapor deposition W technology

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 2, 2006, Pages 523-533

  Ivanov, Ivan P ^a   Sen, Indradeep ^a   Keswick, Peter ^a  

^a CYPRESS SEMICONDUCTOR   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM BULK RESISTIVITY; FILM RESISTIVITY; KIRCHHOFF'S RULE;

ELASTICITY; ELECTRIC CONDUCTIVITY; GRAIN BOUNDARIES; MICROSTRUCTURE; NUCLEATION; SEMICONDUCTOR MATERIALS;

CHEMICAL VAPOR DEPOSITION;

EID: 33645528362     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2166859     Document Type: Article

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