Etch trends in electrochemical machining with ultrashort voltage pulses

Electrochemical and Solid-State Letters

Volumn 9, Issue 1, 2006, Pages

  Kenney, J A ^a   Hwang, G S ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COMPUTATIONAL METHODS; ELECTRIC POTENTIAL; ELECTROCHEMISTRY; MATHEMATICAL MODELS; ULTRASHORT PULSES;

ELECTROCHEMICAL MACHINING; PULSE DURATION; VOLTAGE PULSES;

ETCHING;

EID: 33645526704     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2136250     Document Type: Article

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